15:30 - 16:00
|
Paper No. 2018-THU-S0802-I001
|
Invited Speaker: Pei-Ting Chou
|
MicroLED Display Applications and New Opportunities
Pei-Ting Chou
MicroLED display is believed to be the next generation of flat panel display. The concept of MicroLED
display is simple. It can be considered as an LED video wall but shrunk into consumer product sizes with
micro-meter scale LED chips as sub-pixel emitting elements.
The reasons to develop MicroLED display are lower energy consumption and better environmental reliability.
Current LCD is a light absorbing device, which means most of light from backlight unit is wasted and
transformed to heat. This will be a big energy crisis while we use more and more displays. OLED seems can
reduce some energy consumption as an emissive display, but it is limited by material lifetime and weak
environmental reliability. MicroLED could be a good solution by highly efficient inorganic LED chips.
MicroLED display can meet all requirements for high performance display. It can achieve ultra-high
resolution, ultra-low power consumption, high brightness, flexible display with any shape, fast response time,
and good environmental reliability. MicroLED is the only display technology can fulfill high display quality
standard, and we believed MicroLED will be the ultimate display technology.
By using PlayNitride proprietary PixeLED® display technology, we have built 3.12” 256x256 pixels and 5”
320x160 pixels full color MicroLED sample. This sample was built by passive matrix backplane, red, green,
and blue MicroLED chips, and a passive matrix OLED driver IC. Both displays are transparent with more
than 50% transmittance, and high brightness more than 800 nits.
MicroLED display is an emerging technology with high brightness, wide color gamut, and high aperture
ratio. In additional to traditional display applications, MicroLED display can be used for innovative display
technology. Based on our proprietary PixeLEDTM Display technology, we demonstrated two MicroLED
displays which can show the ultimate display performance.
|
|
16:00 - 16:15
|
Paper No. 2018-THU-S0802-O001
|
Chih-Hsun Lin
Award Candidate
|
Inverted Polymer White LED with Quantum Dots Emission Layer and Nanorod Structure
Chih-Hsun Lin;Po-Sung Su;Ching-Ting Lee;Hsin-Ying Lee
CdSe/ZnS quantum dots (QDs) and poly(N-vinylcarbazole) polymer material were used to fabricate the emission layer of inverted white organic light-emitting diodes (WOLED). Furthermore, an ITO nanorod with period of 1.5 µm was added. The maximum efficiency was improved to 3.12 cd/A and the CIE of the WOLEDs was (0.329, 0.331).
|
|
16:15 - 16:30
|
Paper No. 2018-THU-S0802-O002
|
Shih-Kang Lin
Award Candidate
|
Lighting Design with Beam Shaping for Specific Sport Field
Shih-Kang Lin;Kai-Cheng Wang;Xuan-Hao Lee;Yeh-Wei Yu;Tsung-Hsun Yang;Ching-Cherng Sun
We proposed a lighting lens design with an optical efficiency of 77.6% and optical utilization factor at the region of 36 m × 21 m above 60%. Therefore, the proposed luminaire not only fits the geometrical shape of the sport field but also the regulation of international sport field.
|
|
16:30 - 16:45
|
Paper No. 2018-THU-S0802-O003
|
Jin-Jia Yang
Award Candidate
|
Study on High Efficiency Quantum Dots based LED for Full Color Display Application
Jin-Jia Yang;Chun-Fu Lee;Tzu-Yu Chen;Po-Tsung Lee;Chin-Wei Sher;Hao-Chung Kuo
To solve the fast anion-exchange phenomenon and further reduce quantum dots(QD) self-aggregation, We used red CdSe/ZnS QD and green perovskite QD to fabricate liquid-type white LED, which achieve outstanding performance of high luminous efficiency, wide color
gamut, and high stability.
|
|
16:45 - 17:00
|
Paper No. 2018-THU-S0802-O004
|
Yueh-Ting Chen
Award Candidate
|
Investigation of Current Collapse behavior under High and Low Voltage Operation in E-mode GaN Based HEMTs with Gate Field Plate
Yueh-Ting Chen;Wei-Ren Lin;Chun-Hsun Lee;Yu-Hsuan Lee;Jian-Jang Huang
Our study shows contradictory results of the adoption of gate field plates for suppressing current collapse. At the low off-state drain bias, current collapse is deteriorated with the additional gate capacitance. At higher voltage, the effect of gate field plate takes in by re-shaping the vertical electric field distribution.
|
|
17:00 - 17:15
|
Paper No. 2018-THU-S0802-O005
|
Chun-Yuan Tan
Award Candidate
|
Sputtering Deposition of an N-type GaN thin film with Si and Ti co-doping on a glass substrate
Chun-Yuan Tan;Wei-Sheng Liu;Yu-Lin Chang;Cheng-Ting Tsai
In this study, the Si and Ti co-doped n-type GaN films with ZnO buffer layers were grown by using the sputtering technique on amorphous glass substrates. The Hall measurement results show that Si-Ti co-doped n-type GaN can reduce resistivity of GaN film to 2.63×10-1ohm-cm with carrier concentration of 4.58×1019cm-3
|
|