Session Index

Thin-Film Technology and Optical Engineering

Thin-Film Technology and Optical Engineering III
Friday, Dec. 7, 2018  10:45-12:30
Presider: Sheng-Hui Chen
Room: R216
Notes:
10:45 - 11:00 Paper No.  2018-FRI-S1003-O001
Ching-Tang Li
Award Candidate
A Comparative Study of Thermochromic VO₂ Thin Films with and without Anatase TiO₂ Seed Layer
Ching-Tang Li;Chien-Jen Tang;Wei-Hsuan Hsu

The vanadium dioxide and titanium dioxide thin films were deposited by reactive high-power impulse magnetron sputtering and the thermochromic vanadium dioxide with and without anatase titania seed layer was discussed.

 
 
11:00 - 11:15 Paper No.  2018-FRI-S1003-O002
Yun-Cheng Yeh
Surface Modification of Zinc Oxide Nanorods with Cuprous Oxide Applied to Non-Enzymatic Glucose Sensor
Yun-Cheng Yeh;Hsi-Chao Chen;Ming-Han Wen

Zinc oxide(ZnO) seed layer deposited on ITO glass by magnetron sputtering, and ZnO nanorods were synthesized by hydrothermal method afterwards. The growth of Cu2O/ZnO nanocomposites were verified by FESEM. The cyclic voltammetry showed that the reaction current did increase linearly with the concentration of glucose.

 
 
11:15 - 11:30 Paper No.  2018-FRI-S1003-O003
REN YI CHEN
The electrochromic and optical properties of zirconium oxide film deposited by cathode arc method
REN YI CHEN

Zirconium oxide (ZrO2) was deposited by cathode arc as the ion-transmission layer for the tungsten oxide electrochromic (WO3) film. The ZrO2 thin film deposited with different chamber pressure from 15 to 65 mTorr for the Glass/ITO/WO3/ZrO2 films. The chamber pressure of 45 mTorr has the maximum transmission variation of 55.43%.

 
 
11:30 - 11:45 Paper No.  2018-FRI-S1003-O004
Jin-Yu Shih
Multi-gas barrier film stacked by RF magnetron sputtering system
Jin-Yu Shih;Hsiao-Lun Chen;Yan-An Lin;Wei-Bo Liao;An-Chi Wei;Chien-Cheng Kuo

The gas barrier SiOx:C/ SiO2-like multilayer thin films were deposited with hexamethyldisiloxane(HMDSO) and oxygen flow by this system. The WVTR value of six pair multilayer thin films was 2.5 × 10−3 g/m2 /day was measured by electrical calcium test and the total thickness was only 450 nm.

 
 
11:45 - 12:00 Paper No.  2018-FRI-S1003-O005
Ting Hua Hong
Optical and Mechanical Properties of Aluminum Oxynitride Films Deposited by Different Methods.
Ting Hua Hong;chien Jen Tang

The study compared the different method to deposit the Aluminum Oxynitride films, furthermore, analyzing the optical, mechanical and wear-resistance of Aluminum Oxynitride films by UV-Vis/NIR spectrophotometer, twyman-Green interferometer and oscillating abrasion tester.