Session Index

In this study, adding a central window to the floating-type VOx microbolometers can reduce the plasma etching time from 4 hr 45 min to 2 hr 30 min for removing the sacrificial layer. Which makes the fabrication process more efficient and doesn’t make affect to the device responsivity.

 

We have changed the deposition temperature of vanadium dioxide film deposited by sputtering. The different deposition temperature results in different Raman and AFM results, which corresponds different crystallinity. The obvious change on resistance-temperature (R-T) curve have been found.

 

We proposed micron-fluorescent arrays with high efficiency rare-earth-element-free solutions that can be applied to micro-LED. The method is to spin the fluorescent film on the substrate and then use photolithography and RIE to make the micron fluorescent array, so mass transfer is not required.

 

Deep-ultraviolet photodetectors were fabricated with epitaxial zinc gallium oxide (ZnGa2O4) films by sputtering. The photodetector shows an excellent device performance, where the photocurrent, dark current, and responsivity (@5 V and 240 nm) are measured to be 5.69 × 10−8 A, 5.77 × 10−12 A, and 0.71 A/W, respectively.

 

Effects of TiO2, Al2O3 microparticles concentrations doped with the silicone films on the short currents of the solar cell in LSC were investigated. The short current of the solar cell almost increased with an increase of the oxide microparticles concentration.

 

In this study, the bidirectional reflectance distribution function (BRDF) measurement of an automatic optical inspection (AOI) system was discussed. By investigating the BRDF of sample thin film tests, we can improve the capability of detection for the barely-visible defects. Preliminary results of commercial polarizer experiment validated the proposed scheme.

 

The influence of oxygen flow ratios and annealing temperature in vacuum on the structure and optical properties TNO films were studied by using X-ray diffraction and energy dispersion spectroscopy, respectively. An excellent average transmittance (~74%) and low reflectivity (~14%) of TNO film at 10% oxygen ratio was obtained.

 

Gold nanoparticles are prepared by using sodium citrate reduction method, and then Cys is modified on AuNPs film at different temperatures. Finally, Cys/AuNPs/ITO film is used for detecting copper ions. The results show that Cys/AuNPs/ITO film modified at high temperatures has a red-shift value of maximum for copper ions sensing.

 

In this study, the thin film transistors and their optical properties was investigated with indium gallium oxide (IGO) channel layer which fabricated by using an RF magnetron sputter system. The Iphoto/Idark ratio was 2.1×10^5 and the UV to visible rejection ratio was 6.29×10^3.

 

An indium tungsten oxide (IWO) ultraviolet photodetector is fabricated with radiofrequency (RF) magnetron sputtering. The devices were depositited with IWO thin films with various oxygen partial pressure ambiences. In this work, the influences of oxygen vacancy concentration are discussed.

 

The purpose of this study was to determine what influence crystal structure has on the mechanical characteristics of TiO2 films. Here, we show that the crystal structure influences the hardness of the film.

 

The anti-reflection coating was deposited on polyethylene terephthalate (PET) by e-beam Evaporator. Using the phase shifting moiré interferometer measured the residual stress of multilayer film in full filed and the stacked film was measured its stress every layer, and analyze optical effect of the residual stress.

 

PLD was used to prepare ZnO:Bi film on C-face sapphire. The characteristics of ZnO:Bi films grown under different doping concentrations, ambient oxygen pressures and annealing conditions were compared in the experiment. XRD results showed that the film grown at 3% target concentration had c-axis orientation and the best crystal quality.

 

The optimum thickness ITO/TNO films deposited on the glass substrate is 80/20nm, reflectance is reduced by 5.06%, the optimum thickness ITO/TNO films deposited on the silicon substrate is 70/30nm, reflectance is reduced by 3.9%. Moreover the reflectance on the silicon substrate was improved in the near-infrared range than the glass.

 

We present a high-sensitivity relative humidity sensor based on ITO coatings and lossy mode resonance effect. A new humidity sensor has a high sensitivity with D-shaped fiber residual thickness of 73 μm and ITO thin-film thickness of 23 nm. The sensitivity of the proposed humidity sensor is 8.609 nm/%RH.

 

N-In codoped ZnO films were deposited on Si(100) by UPS. The structural,electrical and optical properties of the ZnO based films were investigated. Results indicated that the best p-type with the resistivity of 0.58Ωcm ,mobility of 3.46 cm2/Vs ,and carrier concentration of 3.11x1018 cm-3 was obtained at 5% In-doped ZnO:N film

 

Sb–N dual-acceptor doped p-type ZnO films were grown on silicon substrates by the spray pyorolized method. The thin films is obtained with the best electrical properties show a hole concentration in the order of 1019cm3 and resistivity 0.557 Ωcm and p-type.

 

An ultrafast laser induces nonlinear absorption effects for laser machining of glass sample, and also adopts a simply photothermal model to study heating process with multiphoton excitation. To understand the phenomenon, we will analyze the photothermal reaction for different excitation wavelength, laser power density, and repetition rate from theoretical model.

 

We present the ultrafast carrier-transfer dynamics in the layer number controllable molybdenum disulfide grown by using rapid sulfurization of pre-deposited metal film. We’ve performed Raman, absorption, photoluminescence, and pump-probe transient absorption spectroscopy to analysis the material properties. We observed monotonically change of carrier-transfer dynamics in 1-layer, 3-layer, 5-layer MoS2 films.

 

An optical thin film that has a low refractive index and high mechanical strength can be produced by electron beam (EB) deposition and sputtering evaporation.